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All Products / Laser Optics / Laser Optical Assemblies / Beam Shapers / AdlOptica aplanoXX Aplan Objectives
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800nm, 0.80 NA, aplanoXX Aplan Objective | aplanoXX NA0.8_20_800

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AdlOptica aplanoXX Aplan Objectives

AdlOptica aplanoXX Aplan Objectives

AdlOptica aplanoXX Aplan Objectives
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Stock #19-492 3-5 days
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S$11,795.75
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S$11,795.75
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Clear Aperture CA (mm):
20
Design Wavelength DWL (nm):
800
Diameter (mm):
44.00
Focal Length FL (mm):
12.50
Model Number:
aplanoXX NA0.8_20_800
Length (mm):
54.10
Mount:
C-Mount
Numerical Aperture NA:
0.80
Type:
Objective
Working Distance (mm):
2.5 (1.6 with Protective Window)
Field of View (°):
±0.3
Note:
Includes aplanoXX objective, mounted protective window (#19-496), and spanner wrench #19-497)
Wavelength Range (nm):
770 - 900
Damage Threshold, By Design: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification.
100 mJ @ 5ns
300 μJ @ 1ps
Focusing Depth (mm):
0 - 4
Beam Diameter (mm):
20 (maximum)
Damage Threshold, Pulsed:
100 mJ @ 5ns
300 μJ @ 1ps

Regulatory Compliance

RoHS 2015:
Compliant
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Certificate of Conformance:
View
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REACH 241:
Compliant
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Product Family Description

AdlOptica aplanoXX Aplan Objectives compensate for spherical aberration and coma when focusing into glass, sapphire, silicon carbide, silicon, PMMA, and other transparent materials at depths up to 4mm. These objectives are designed to be used with ultrafast solid-state and fiber lasers and are optimized for 800nm (Ti:sapphire) and 1030nm (Yb:doped). Featuring C-Mount threading and an optical design insensitive to misalignment, these objectives are easy to integrate into laser systems. AdlOptica aplanoXX Aplan Objectives are ideal for micromachining glass, 3D nanofabrication, waveguide recording, and selective laser etching. A collar on the objective allows for manual adjustment of focus and a replaceable front window protects from debris during materials processing.